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ANALYSIS AND DESIGN OF A NEW KIRKPATRICK-BAEZ MIRROR SYSTEM FOR MICROBEAMS

机译:用于微观芯片的新Kirkpatrick-Baez镜像的分析与设计

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The 4B beamline of Pohang Accelerator Laboratory is used for microdiffraction and microfluorescence experiments using an X-ray microbeam. The X-ray microbeam has been focused down to 3 μm × 3 μm using a Kirkpatrick-Baez (K-B) mirror system with vertically and horizontally focusing mirrors arranged in series. In this research, a new K-B mirror system was developed for focusing a microbeam to 1 μm × 1 μm at the 4B beamline of the Pohang Light Source-II. The new K-B mirror system consists of a pair of assemblage having three mechanisms that adjust the position, pitch, and curvature of each vertically and horizontally focusing mirrors and stages that support both the assemblages to enable translations along two orthogonal axes and rotation on the horizontal plane. Both the pitch- and curvature-adjusting mechanisms were designed as flexural mechanisms driven by their respective single actuators to minimize the movement of the mirror center even when the pitch or the curvature of each mirror was adjusted. The K-B mirror system with these features will be robust against possible disturbances and will help promote easy and simple mirror adjustment. This paper describes the whole design of the new K-B mirror system in detail and the structural analysis results of the pitch- and the curvature-adjusting mechanisms, and reports the operation principle of the curvature-adjusting mechanism.
机译:Pohang Accelerator实验室的4B梁线用于使用X射线微沟微荧光实验。 X射线MicroBeam使用kirkpatrick-baez(k-b)镜面系统聚焦至3μm×3μm,横向和水平聚焦镜串联布置。在该研究中,开发了一种新的K-B镜像系统,用于在浦项光源-II的4B梁线上聚焦到1μm×1μm的微距。新的KB镜系统由一对组件组成,该组件具有三种机构,该机构调整每个垂直和水平聚焦镜的位置,间距和曲率,以及支持组件的阶段,以实现沿两个正交轴和水平平面上的旋转的转换。 。俯仰和曲率调节机构都被设计为由各自的单个致动器驱动的弯曲机构,以便在调节每个镜子的间距或曲率时,即使调节每个镜子的距离也会最小化镜子中心的运动。 K-B镜像系统具有这些功能将适用于可能的干扰,并有助于促进轻松简单的镜像调整。本文详细介绍了新的K-B镜像系统的整体设计,以及斜面调节机构的结构分析结果,并报告了曲率调节机构的操作原理。

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