Comparative study of thin films by magnetron sputtering different phase structure Ti33Al67 targets

摘要

Two kinds of targets which are the same composition and completely different phase structure deposit film on cemented carbide substrates.The magnetron sputtering method is used.And the phase structure, surface morphology, composition and bonding strength are tested by using XRD, SEM, EDX and the indentation method.The results show that the Al and Ti of the unalloyed target partly react to Al2Ti phase in the sputtering process, and HCP Ti phase also exists.The grain size of the film deposited by the unalloyed target is larger than the film deposited by the alloyed target, and its bonding strength is also better.It is deduced that two kinds of film's growth mechanism in sputtering process are different.Moreover, the wettability between the unalloyed target film and the substrate is strong, and it grows in Frank-van der Merwe model.But the wettability between the alloyed target film and the substrate is weak, and it grows in Volmer-Weber model obviously.