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Influence of Annealing Temperature on the Properties of Nanostructured ZnO Thin Film Prepared by Sol-Gel Method

机译:退火温度对溶胶 - 凝胶法制备纳米结构ZnO薄膜性能的影响

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Nanostructured ZnO thin film has been prepared by using sol-gel method. The influence of annealing temperature on the structural, surface morphology and the properties has been investigated. The morphology of the nanostructured ZnO was observed by scanning electron microscopy (SEM) and their properties were measured by using the I-V measurement. The annealing temperature of 500°C, 600°C and 700°C has been observed and the I-V measurements were measured at different relative humidity to studies on the sensitivity of the nanostructured ZnO. The SEM demonstrates that the glass substrate was deformed at 700°C of annealing temperature and I-V measurement studies shows that the resistance of nanostructured ZnO thin film is decreased with annealing temperature and relative humidity. Sensitivity also decreases with the increases of annealing temperature.
机译:通过使用溶胶 - 凝胶法制备纳米结构ZnO薄膜。研究了退火温度对结构,表面形态和性质的影响。通过扫描电子显微镜(SEM)观察纳米结构ZnO的形态,通过使用I-V测量测量它们的性质。已经观察到500℃,600℃和700℃的退火温度,并且在不同的相对湿度下测量I-V测量以研究纳米结构ZnO的敏感性。 SEM表明,在退火温度和I-V测量研究的700℃下使玻璃基板变形,I-V测量研究表明,纳米结构ZnO薄膜的电阻随退火温度和相对湿度而降低。随着退火温度的增加,敏感性也降低。

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