Influence of Ta-doped on the Morphology and Properties of Sputtered Films

摘要

The pure Mo and Ta-doped Mo targets with different microstructures were sputtered by the same sputtering line under the same sputtering process. The structures, surface morphologies and corrosion resisting properties of the films have been analyzed with XRD and SEM, square resistance and corrosion resistance have been measured with four-probe array method and salt spray test. The results indicate that Ta is doped by replacing Mo atoms. Compared with the pure Mo thin film, the crystal orientation of Ta-doped Mo thin film is not changed and still retains preferred crystal orientation in the (110) direction, the surface morphology is smooth, compact and uniform, the corrosion resistance of Ta-doped Mo thin film is better.