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Effects of substrate etching on laser-induced damage of 355nm space coatings

机译:基材蚀刻对355nm太空涂层的激光诱导损伤的影响

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355nm UV lidars are of high spectral resolution and are demanded in space-borne applications. As a result of the vulnerability of the coatings in the laser systems and coatings irradiated by 355nm UV laser are more prone to be damaged than visible or infrared lasers. Thus, the study of the processing on substrate surface will contribute to the improvement of the performance of optical coatings. The dual ion beam sputtering can provide compact and stable layers for space applications. Thus, Al_2O_3/SiO_2 high reflection (HR) and anti-reflection (AR) coatings deposited on acid etched substrate were prepared by dual ion beam sputtering. Damage characteristics on the surface were analyzed after 355nm laser irradiation on the coatings. The damage morphology measured by focused ion beam-field emission scanning electron microscopy (FIB-FESEM) and depth measurement of damage pits hint that the damage of HR coatings occurs in the coating layers rather than the substrate. The HR and AR coatings deposited on acid etched substrate are of larger changes on laser-induced damage thresholds (LIDT) than these on the non-etched substrate. The damage mechanisms of coatings are attributed to thermal absorption and the damage area is a molten pool surrounded by mechanical ejection. The etched area with nicks caused the damage on the HR coatings deposited on etched substrate. And due to the elimination of defects on the subsurface of the AR coatings by etching method, the LIDT of AR coatings was improved.
机译:355nm的UV Lidars具有高光谱分辨率,需要在太空应用中进行。由于涂层的脆性在激光系统中的脆性和355nm uV激光器照射的涂层比可见或红外激光器更容易损坏。因此,对基板表面处理的研究将有助于改善光学涂层的性能。双离子束溅射可以为空间应用提供紧凑且稳定的层。因此,通过双离子束溅射制备沉积在酸蚀刻基板上的AL_2O_3 / SIO_2高反射(HR)和抗反射(AR)涂层。在355nm激光照射到涂层上后,分析了表面上的损伤特性。通过聚焦离子束场发射扫描电子显微镜(FIB-FESEM)测量的损伤形态和损伤坑的深度测量暗示HR涂层的损坏发生在涂层层而不是基材中。沉积在酸蚀刻基板上的HR和Ar涂层对非蚀刻基材上的激光诱导的损伤阈值(LIDT)的变化较大。涂层的损伤机制归因于热吸收,损伤区域是由机械喷射包围的熔池。具有刻痕的蚀刻区域导致沉积在蚀刻基底上的HR涂层的损伤。由于通过蚀刻方法消除了Ar涂层的地下缺陷,改善了Ar涂层的盖子。

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