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Optical property of random inverted-pyramid textures on Si surface by etching with N-fluoropyridinium salts

机译:用N-氟吡啶盐蚀刻蚀刻Si表面随机倒置金字塔纹理的光学性能

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摘要

We have proposed a new photo-etching method to form Si surface textures with N-fluoropyridinium salts. Si is etched by applying N-fluoropyridinium salts to its surface and exposing the surface to light. Etching depth increases with light intensity. We have formed random inverted-pyramid textures on a Si surface by controlling the light intensity at a constant temperature.
机译:我们提出了一种新的光蚀刻方法,形成具有N-氟吡啶盐的Si表面纹理。通过将N-氟吡啶鎓盐施加到其表面并将表面暴露于光来蚀刻Si。蚀刻深度随着光强度的增加而增加。通过在恒定温度下控制光强度,我们在Si表面上形成了随机倒置金字塔纹理。

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