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Effect of Annealing Temperature on the Crystallinity, Morphology and Ferroelectric of Polyvinylidenefluoride-Trifluoroethylene (PVDF-TrFE) Thin Film

机译:加油温度对聚偏氟乙烯 - 三氟乙烯(PVDF-TRFE)薄膜结晶度,形态和铁电的影响

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The annealing temperature for 250 nm PVDF-TrFE (70:30 mol%) spin coated thin films were varied at solvent evaporation (T_s = 79°C), Curie's transition (T_c= 113°C), till melting temperature (T_m = 154°C). XRD measurement showed that, there was an improvement in the crystallinity of the annealed films, consistent with the increased in the annealing temperatures. Morphological studies of the annealed PVDF-TrFE thin films as observed with Field Emission Scanning Electron Microscope (FESEM) (100k magnification), showed enhanced development of elongated crystallite structures known as ferroelectric crystal. However, thin film annealed at 160°C(AN160) showed fibrous-like structure with appearance of nanoscale separations, which suggested high possibility of defects. Ferroelectric characterization indicated an improvement in the remnant polarization of annealed PVDF-TrFE thin films with the exception to AN160 in which leakage of current was inevitable due to the presence of cracks on the film surface.
机译:250nm PVDF-TRFE的退火温度(70:30 mol%)旋涂薄膜在溶剂蒸发(T_s = 79℃),居里的过渡(T_c = 113℃),直至熔化温度(t_m = 154 °C)。 XRD测量表明,退火薄膜的结晶度有所改善,与退火温度的增加一致。用现场发射扫描电子显微镜(FESEM)(FESEM)观察的退火PVDF-TRFE薄膜的形态学研究(100K放大率)显示出称为铁电晶体的细长微晶结构的增强发展。然而,在160℃(AN160)下退火的薄膜显示出纤维状的结构,具有纳米级分离的外观,这表明缺陷的可能性高。铁电特征表明退火的PVDF-TRFE薄膜的剩余极化的改善,其异常是AN160,其中由于膜表面上存在裂缝,电流泄漏是不可避免的。

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