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Preparation of ITO Target by Molecular Dynamics Simulation with Normal Pressure Sintering Method

机译:常压烧结法的分子动力学模拟制备ITO靶

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The volume change of ITO target sintering at different temperature of 1673 K, 1773 K, 1793 K, 1823 K, 1853 K and 1873 K were investigated by means of molecular dynamics simulation. The experimental results revealed that the rate of reduction in bulk was very fast in prior period of ITO green sintering process, and it was slow in later period. The atomic model of ITO green got the smallest value of 890.918 nm~3 at the 1853 K, and the ITO green can receive the highest densification at this temperature. The simulation results can provide theoretical direction for ITO target normal pressure sintering method.
机译:通过分子动力学模拟研究了在1673k,1773k,1793k,1823k,1853k和1873k的不同温度下的ITO靶烧结的体积变化。实验结果表明,在ITO绿色烧结过程的前期,散装量的减少率非常快,在后期速度缓慢。 ITO绿色的原子模型在1853 k处获得了​​890.918 nm〜3的最小值,ITO绿色可以在该温度下获得最高致密化。仿真结果可以为ITO目标常压烧结方法提供理论方向。

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