首页> 外文会议>SiGe, Ge, and Related Compounds: Materials, Processing, and Devices Symposium >Nano-synthesis Approach to the Fabrication of Monocrystalline Silicon-like (III-V)_yIV_(5-2y) Semiconductors
【24h】

Nano-synthesis Approach to the Fabrication of Monocrystalline Silicon-like (III-V)_yIV_(5-2y) Semiconductors

机译:纳米合成方法制备单晶硅样(III-V)_YIV_(5-2Y)半导体的制备方法

获取原文

摘要

A new synthetic strategy for (III-V)_y(IV)_(5-2y) materials is introduced to avoid III-V/IV phase separation. As a proof of principle, crystalline AlPSi_3 with thickness <900 am was grown directly, and virtually lattice matched, on Si(100) substrates by combining Al atoms and the well-known P(SiH_3)_3 molecule as co-reactants using gas-source MBE techniques at temperatures < 600 °C. Intermediate "Al:P(SiH_3)_3" complexes containing (Al-P)-Si_3 cores are presumed to form, and incorporate intact into highly stable diamond-like solid devoid of phase segregation and defects, and a composition with maximal III-V content in which "donor-acceptor" pairs are isolated within an Si matrix. This strategy is generalized to: (i) expand the composition space for this class of materials (ii) grow bulk-like films for detailed comparative characterization and (iii) alloy on the III-V and/or IV sublattice as a means of tuning lattice constants and band gaps. Assembly mechanisms, thermochemistry and key materials properties are elucidated via molecular/solid-state simulation.
机译:对于(III-V)_y(IV)的新的合成策略_(5-2y)材料被引入,以避免III-V族/ IV相分离。作为原理的证明,结晶AlPSi_3与厚度<900时通过组合Al原子和公知的P(SiH_3)_3分子如使用气体的共反应物(100)衬底上直接生长,几乎晶格匹配,在Si源MBE技术在温度<600℃。中间“的Al:P(SiH_3)_3”含有复合物(铝-P)-Si_3芯被假定的形式,并纳入完整地进入高度稳定的类金刚石相偏析和缺陷的固体缺乏,并具有最大的III-V的组合物内容,其中“供体 - 受体”对被在Si基体中分离出来。这种策略被概括为:(ⅰ)扩大这类材料的组合物空间(ⅱ)生长块状薄膜用于在III-V族和/或IV亚晶格作为调谐的手段详细的比较特性以及(iii)合金晶格常数和带隙。组装机构,热化学和关键材料特性通过分子/固态模拟阐明。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号