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Ferroelectric and Optical Properties of BST/BZT/BST Sandwich Structure Thin Films Prepared by RF Sputtering

机译:BST / BZT / BST夹层结构薄膜的铁电和光学性质通过RF溅射制备

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In this work, (Ba_(0.65)Sr_(0.35))TiO_3 (BST) and Ba(Zr_(0.20)Ti_(0.80))O_3 (BZT) ceramic targets were prepared using the traditional solid-state reaction technique, which were sintered at 1200°C for 2 h. The thin films of BST, BZT and sandwich structure BST/BZT/BST were grown on Pt/Ti/SiO_2/Si(100) and Si(100) substrates by rf-sputtering at 500°C, respectively. And all samples crystallied at temperatures 650°C for 30 min in oxygen atmosphere. The cross-sectional images of the thin films were characterized by scanning electron microscope (SEM). The dielectric constant and dissipation factor tanδ of the BZT, BST and BST/BZT/BST thin films are 680 and 0.030, 240 and 0.021, 85 and 0.018, respectively at 100 kHz. Compared with BST and BZT films, the BST/BZT/BST film has lower dielectric constant and lower dissipation. The remanent polarization (P_r) of the sandwich structure BST/BZT/BST thin film is up to 9.57 μC/cm~2, the P_r value is larger than that BST (0.25μC/cm~2) film and BZT (8.45μC/cm~2) film. The optical properties (refractive index n and extinction coefficient k) of the BST/BZT/BST film on Si(100) substrate were measured by n & k analyzer 2000.
机译:在这项工作中,使用传统的固态反应技术制备烧结的制备(Ba_(0.65)Sr_(0.35))TiO_3(BST)和BA(Zr_(0.20)Ti_(0.80))O_3(BZT)陶瓷靶标。在1200℃下2小时。 BST,BZT和夹层结构BST / BZT / BST的薄膜通过在500℃下通过RF溅射在Pt / Ti / SiO_2 / Si(100)和Si(100)基底上生长。并且所有样品在650℃的温度下结晶30分钟,氧气气氛中30分钟。通过扫描电子显微镜(SEM)表征薄膜的横截面图像。 BZT,BST和BST / BZT / BST薄膜的介电常数和耗散因子Tanδ分别在100kHz下分别为680和0.030,240和0.021,85和0.018,85和0.018。与BST和BZT薄膜相比,BST / BZT / BST膜具有较低的介电常数和较低的耗散。剩余极化的夹层结构BST / BZT / BST薄膜(P_R)高达9.57μC/厘米〜2,P_R值比BST(0.25μC/厘米〜2)膜和BZT(8.45μC更大/ cm〜2)薄膜。通过N&K分析仪2000测量Si(100)衬底上的BST / BZT / BST膜的光学性质(折射率N和消光系数K)。

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