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Synthesis of copper oxide by reactive magnetron sputtering for photoelectrochemical water splitting

机译:用反应磁控溅射对光电化学水分裂的合成铜氧化物

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Copper oxide contains of bivalent copper and monovalent copper, which is widely distributed in earth resources. In this article, the copper oxide films were deposited on transparent conducting glasses (FTO) by magnetron reactive sputtering under different sputtering conditions of power and oxygen flow. The use of reactive magnetron sputtering can deposit a uniform copper oxide film with large scale rapidly. An analysis in detail on composition, morphology, optical and electrochemical properties of the sputtered copper oxide film was carried out. It is found that, the copper oxide with sputtering power of 30 W and O_2 flow of 7 sccm provide a photoinduced current of -3.0 mA cm~(-2) under a bias potential of -0.5 V (vs. Ag/AgCl), which was found to be near 1.5 times higher than that with O_2 flow of 5 sccm (30 W), and 3 times higher than O_2 flow of 7 sccm (60 W), respectively.
机译:氧化铜含有二价铜和一价铜,其广泛分布在地球资源中。在本文中,通过在不同的溅射条件下通过磁控溅射溅射在透明导电玻璃(FTO)上沉积氧化铜膜。反应磁控溅射的使用可以迅速沉积大规模均匀的氧化铜膜。进行了溅射氧化铜膜的组成,形态,光学和电化学性质的细节分析。结果发现,在7 sccm的30 w和O_2流动的溅射功率的氧化铜在-0.5V(Vs.Ag / AgCl)的偏置电位下提供-3.0 mA cm〜(-2)的光致电流。发现近1.5倍的距离为5 sccm(30 w)的O_2流量,分别比O_2流量高出3倍,分别为7 sccm(60 w)。

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