Metal grain suppression and DOI capture rate improvement in 32 nm technology node

摘要

• Advanced Bright Field Inspection Tools: Advanced bright field Inspection tools can provide better WPH, less time to setup recipes, higher sensitivities benefits. However, metal grains suppression still a big challenge for inspection. • Metal Grain Suppression : Series methodologies for suppressing metal grain are demonstrated, it indicated that metal grains suppression can not fulfill by single methodology. It needs to find out the feasible light source and optimized one step tuning scan segment threshold setting, and furthermore add the in-line defect organizer operation if needs. • Increase the DOI Capture Rate: After recipe optimization, defects of interesting capture rate increases due to suppress the nuisance of metal grain. Unique defect types are found after suppressing the nuisance. • Implement Into Other Layers: Back-end Cu Process & Font-end Poly-silicon also can implement the same methodologies to suppress the nuisance of grain.