Gas Injection Apparatus for Vacuum Chamber

摘要

We present in this article a gas injection apparatus which comprises the gas injector and its electronic command for vacuum chamber applications. Some of these applications are thin-film deposition by a pulsed laser deposition (PLD) or a cathodic arc deposition (arc-PVD) and the plasma generation. The electronic part has been developed to adjust the flow of the gas inside the vacuum chamber by controlling both of the injector's opening time and the repetition frequency to allow a better gas flow. In this case, the system works either on a pulsed mode or a continuous mode for some applications. In addition, the repetition frequency can be synchronised with a pulsed laser by an external signal coming from the laser, which is considered as an advantage for users. Good results have been obtained using the apparatus and testing with Argon and Nitrogen gases.