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Cold Isostatic Pressing-normal Pressure Sintering Behavior of Amorphous Nano-sized Silicon Nitride Powders

机译:无定形纳米型氮化硅粉末的冷等静压 - 正常压力烧结行为

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The amorphous nano-sized silicon nitride powders were sintered by cold isostatic pressing -normal press sintering method. The sintering additives of Y_2O_3 and Al_2O_3 powders with average grain size less than 20nm were prepared by polyacrylamide gel method. Relative density of sintered materials rise and pore size reduce with increasing of cold isostatic pressing. When the pressure is 100MPa, the density is only 48% and average pores size is between 2μm and 20μm which obvious the first particle space. When the pressure is 200MPa, the density is 67% and agglomerated particle size reduce obviously as well as the pores size are between 0.1μm and 1.0μm which appears because of the second particle. Pressed compact with a relative density 74% and average pore size less than 0.5μm reach to a good density state at 300MPa pressure. Sintering material composites with Si_2N_2O and β-Si_3N_4 phases, compared with hot press sintering composites, which indicates that increasing of sintering press is conducive to the formation phase Si_2N-2O. Relative density is above 96% and average pore size is less than 500nm at sintering temperature 1800°C.
机译:通过冷等静压烧结 - 通道压榨烧结方法烧结无定形纳米尺寸的氮化硅粉末。通过聚丙烯酰胺凝胶法制备平均晶粒尺寸的Y_2O_3和Al_2O_3粉末的烧结添加剂。随着冷等静压压制的增加,烧结材料升高和孔径的相对密度减少。当压力为100MPa时,密度仅为48%,平均孔径为2μm和20μm,这明显是第一颗粒空间。当压力为200MPa时,密度为67%,并且凝聚的粒度明显减少,并且孔径为0.1μm和1.0μm,这是由于第二颗粒出现的。压制紧凑,相对密度为74%,平均孔径小于0.5μm,在300mpa压力下达到良好的密度状态。与热压烧结复合材料相比,烧结材料复合材料与Si_2N_2O和β-Si_3N_4相,这表明烧结压榨机的增加有利于地层Si_2N-2O。相对密度高于96%,并且在烧结温度下,平均孔径小于500nm 1800℃。

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