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Effects of Na precursor layer deposited on Mo substrate about (In,Ga)_2Se_3 and CIGS layers

机译:Na前体层沉积在Mo底物上的影响(In,Ga)_2se_3和CIGS层

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Na external doping using Na_2S precursors on Mo/Coming glass substrate is one of the simplest doping methods. But the method affects both surface morphology and preferred orientation of (In,Ga)_2Se_3 and CIGS films, especially when the thickness was increased. The textures of CIGS films prepared with 3-stage process appear to be inherited from the textures of the (In,Ga)_2Se_3 films deposited during the first stage, it can be assumed that the growth of (In,Ga)_2Se_3 films were modified with Na_2S precursors. As the thickness of Na precursor was increased, surface morphology of (In,Ga)_2Se_3 films was more smooth than that of the films which had thin Na precursor. And CIGS thin films made by these (In,Ga)_2Se_3 films showed that (112) orientation was stronger than (220/204) orientation. And also it was investigated there is a close relation about the morphology and the roughness between (In,Ga)_2Se_3 and CIGS films by AFM.
机译:使用Mo /即将玻璃基板上的Na_2S前体Na外部掺杂是最简单的掺杂方法之一。但该方法影响(In,Ga)_2se_3和CIGS膜的表面形态和优选取向,特别是当厚度增加时。用3-阶段过程制备的CIGS膜的纹理似乎是从第一阶段沉积的(In,Ga)_2Se_3薄膜的纹理继承,可以假设(In,Ga)_2se_3薄膜的生长被修改用na_2s前体。随着Na前体的厚度增加,(In,Ga)_2se_3薄膜的表面形态比具有薄Na前体的薄膜更平滑。由这些(In,Ga)_2Se_3薄膜制成的CIGS薄膜显示(112)取向强于(220/204)取向。并且还研究了关于通过AFM(In,Ga)_2se_3和CIGS膜之间的形态和粗糙度的密切关系。

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