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James Green and Jacques Wijenberg: Development of NiMo Bath for Continuous Strip Plating - (PPT)

机译:James Green and Jacques Wijenberg:用于连续带材镀层的Nimo浴 - (PPT)的开发

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A NiMo bath has been developed allowing a high deposition rate. Two regions can be clearly distinguished in the plating window: 1. At low current densities - Oxidic NiMo deposits comprising a high amount of Mo - Poor current efficiency (about 3 %) 2. At high current densities - Metallic NiMo deposits within desired compositional range (ca. 20 wt-% Mo) - Mo content increases linearly with the mass transfer rate - High current efficiency of 70 % - Crack-free NiMo deposits. Patent pending: US 2010/0167087 A1; US 2011/0269051 A1.
机译:已经开发了Nimo浴,允许高沉积速率。在电镀窗口中可以清楚地区分两个区域:1。在低电流密度 - 氧化Nimo沉积物,包含大量的钼效率(约3%)2。在高电流密度 - 金属Nimo沉积物内所需的组成范围内的金属Nimo沉积物(CA.20 WT-%MO) - MO含量随着传质速率的线性增加 - 高电流效率为70% - 无裂缝的NIMO沉积物。专利申请:美国2010/0167087 A1;美国2011/0269051 A1。

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