首页> 外国专利> Continuous strip electroplating appts. - in which strip is turned about its longitudinal axis to achieve more uniform plating

Continuous strip electroplating appts. - in which strip is turned about its longitudinal axis to achieve more uniform plating

机译:连续带状电镀设备。 -其中带材绕其纵轴转动以实现更均匀的电镀

摘要

A continuous metal strip electroplating device consists of a tank which contains two anode boxes at its sides and spaced sink rolls above its bottom. Above the tank and along its centreline is a device for reversing the direction of the strip together with a coiler and decoiler. The improvement is that the strip is turned about its longitudinal axis (pref. by an angle of 45-135 deg.) during its passage between the sink rolls and the direction- reversing device. This is pref. achieved by inclining the sink rolls at about 45 deg. to the centreline of the direction-reversing device. The appts. is useful for nickel plating steel strip for use in Ni-Cd accumulators. The invention avoids preferential nickel plating at the strip edges so that the plating thickness only varies from 0.8 to 1.1 microns compared with from 0.66 to 1.5 microns for appts. This allows higher current densities to be used.
机译:一种连续的金属带状电镀设备,由一个储罐组成,该储罐的侧面装有两个阳极箱,其底部上方有隔开的沉没辊。在储罐上方并沿着其中心线的设备是用于与卷取机和开卷机一起反转带钢方向的设备。改进之处在于,在带材通过下沉辊和换向装置之间的过程中,带材绕其纵轴旋转(优选倾斜45-135度)。这是偏爱。通过将下沉辊倾斜约45度可实现到方向转换装置的中心线。苹果。可用于镍镉蓄电池中的镀镍钢带。本发明避免了在带材边缘处的优先镍镀层,因此镀层的厚度仅在0.8至1.1微米之间变化,而金属镀层的厚度仅为0.66至1.5微米。这允许使用更高的电流密度。

著录项

  • 公开/公告号DE2947507A1

    专利类型

  • 公开/公告日1981-05-27

    原文格式PDF

  • 申请/专利权人 GOTTFRIED HAGEN AG;

    申请/专利号DE19792947507

  • 发明设计人 JENNIGESNORBERT;ENGELWALTER;

    申请日1979-11-24

  • 分类号C25D7/06;

  • 国家 DE

  • 入库时间 2022-08-22 15:13:47

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