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Fabrication of low loss coplanar waveguides on gold-doped Czochralski-silicon

机译:金掺杂Czochralski-芯片上的低损耗共面波导的制造

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Coplanar waveguides fabricated on gold-doped Czochralski-silicon show reduced losses. Gold atoms implanted into silicon substrates compensate for background free carriers introduced by impurities in the material. This leads to an increased silicon resistivity which exhibits lower microwave absorption. High frequency measurements in 1-40 GHz range of coplanar waveguides fabricated on gold-doped silicon show attenuation reductions up to 70%, highlighting the benefits of deep level compensation of shallow level impurities in silicon using gold.
机译:在金掺杂的Czochralski-硅上制造的共面波导显示出降低的损失。植入硅基板的金原子补偿了材料中杂质引入的背景自由载体。这导致硅电阻率增加,其表现出较低的微波吸收。 1-40 GHz范围内的高频测量在金掺杂的硅晶体中制造的共面波导,表现出高达70%的衰减减少,突出了使用黄金硅浅水平杂质的深层补偿的好处。

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