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Structure and photoelectric properties of Dy doped CdS polycrystalline thin films

机译:Dy掺杂Cds多晶薄膜的结构和光电性能

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Using chemical bath deposition (CBD) deposited CdS thin films for two times and prepared CdS films contained different thickness Dy-doping layer by connecting using the vacuum electron beam evaporation method, then studied the structure, surface morphology, optical and electrical properties of the films. The results show that no-doped CdS films is the cubic structure and preferentially oriented in the (111) directions. Its conductive type is N type. After Dy doping the CdS thin films is mixed structure by cubic and hexagonal phase, the conductive type is still N type; the uniformity and compactness of the films are improved. At the same time, the proportion of Cd and S atoms in Dy-doping films are more close to the stoichiometric ratio. Dy-doping can also reduce the resistivity of the films, result in an increasing of carrier concentration and improve the transmittance in the visible region.
机译:使用化学浴沉积(CBD)沉积的CDS薄膜两次,并通过使用真空电子束蒸发方法连接,通过连接含有不同的厚度掺杂层,然后研究了薄膜的结构,表面形貌,光学和电学性能。结果表明,无掺杂的CD膜是立方结构,优先于(111)方向上取向。它的导电类型是n型。在掺杂掺杂Cds薄膜通过立方和六边形相位混合结构,导电类型仍然是n型;改善了薄膜的均匀性和紧凑性。同时,掺杂膜中的Cd和S原子的比例更接近化学计量比。 Dy-Doping还可以降低膜的电阻率,导致载体浓度的增加并改善可见区域中的透射率。

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