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Influence of methane concentration on the electric transport properties in heavily boron doped nanocrystalline CVD diamond films

机译:甲烷浓度对硼掺杂纳米晶CVD金刚石膜中电力运输性能的影响

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A study is presented on the morphology and electric properties of heavily boron-doped nanocrystalline diamond (B:NCD) thin films (=150 nm) grown with two different C/H-ratios (1% and 5%) and a fixed 5000 ppm B/C-ratio in gas phase on fused silica substrates. AFM measurements confirm that a higher C/H-ratio leads to smaller grains and more grain boundaries. Electric transport measurements reveal a higher resistivity and a lower mobility as function of the C/H-ratio for all temperatures measured. The resistivity of the 1% sample is almost not temperature dependent while the 5% sample is much more temperature dependent. The electric transport properties of the grain boundaries, more present in the 5% sample, can be responsible for the difference in transport properties of both samples. The active boron concentration, calculated from the electric transport measurements, is remarkably higher for the 5% sample which indicates there is more boron incorporation for higher C/H-ratios. Although both samples are disordered metals, the 1% sample with the least grain boundaries tends more to the behavior of a highly doped single crystalline diamond film, which behaves like a real metal when heavily boron-doped.
机译:提出了具有两种不同的C / H比(1%和5%)和固定的5000ppm生长的硼掺杂纳米晶金刚石(B:NCD)薄膜(= 150nm)的形态和电性能的研究熔融二氧化硅基材上的气相中的B / C比。 AFM测量确认较高的C / H比率导致较小的颗粒和更多的晶界。电气传输测量显示较高的电阻率和较低的迁移率,以及测量所有温度的C / H比的函数。 1%样品的电阻率几乎不依赖于温度,而5%样品更加温度依赖性。晶界的电动运输性质,更重要的是在5%样品中,可以负责两种样品的运输性质的差异。对于5%样品的5%样品,从电动输送测量计算的活性硼浓度显着较高,这表明较高的C / H比的硼掺入。虽然两个样品是紊乱的金属,但具有最低晶界的1%样品趋于高度掺杂的单晶金刚石膜的行为,这在重硼掺杂时表现得像真正的金属。

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