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THEORY OF EDGE RADIATION. PART II: ADVANCED APPLICATIONS AND IMPACT ON XFEL SETUPS

机译:边缘辐射理论。第二部分:高级应用程序和对XFEL设置的影响

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In this paper we exploit a formalism to describe Edge Radiation, which relies on Fourier Optics techniques, described in another contribution to this conference. First, we apply our method to develop an analytical model to describe Edge Radiation in the presence of a vacuum chamber. Such model is based on the solution of the field equation with a tensor Green's function technique. In particular, explicit calculations for a circular vacuum chamber are reported. Second, we consider the use of Edge Radiation as a tool for electron beam diagnostics. We discuss coherent Edge Radiation, extraction of Edge Radiation by a mirror, and other issues becoming important at high electron energy and long radiation wavelength. Based on this work we also study the impact of Edge Radiation on XFEL setups and we discuss recent results. These proceedings are based on the article [1], to which we address the interested reader for further information and references.
机译:在本文中,我们利用形式主义来描述边缘辐射,依赖于傅立叶光学技术,在此次会议上描述了另一种贡献。首先,我们应用我们的方法来开发分析模型,以描述真空室的存在下的边缘辐射。这种模型基于具有张量绿色功能技术的现场方程的解决方案。特别地,报道了圆形真空室的显式计算。其次,我们考虑使用边缘辐射作为电子束诊断的工具。我们讨论相干边缘辐射,通过镜子提取边缘辐射,以及在高电子能量和长辐射波长下变得重要的其他问题。基于这项工作,我们还研究了边缘辐射对XFEL设置的影响,我们讨论了最近的结果。这些程序基于文章[1],我们为此提供了进一步的信息和参考资料。

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