首页> 外文会议>Joint European Magnetic Symposia >Scaling of Hall coefficient in Co-Bi granular thin films
【24h】

Scaling of Hall coefficient in Co-Bi granular thin films

机译:CO-BI粒状薄膜霍尔系数的缩放

获取原文

摘要

A series of Co-Bi thin films with Co concentrations c=0, 0.05, 0.2, 0.26, 0.3, 0.333, 0.375, 0.545, were grown by magnetron sputtering on Si(100)/SiN_χ substrates. Resistivity measurements at zero field (p_(xx)) as a function of temperature-T exhibit an exponential variation with T in the region of 240K
机译:通过磁控溅射在Si(100)/ SIN_1载物上,通过磁控溅射生长一系列具有CO浓度C = 0,0.2,0.26,0.3,0.333,0.375,0.545的CO-BI薄膜。作为温度-T的函数的零场(P_(XX))的电阻率测量表现出在240k

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号