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Magnetostriction Measurement of Giant Magnetoresistance Films on the Practical Substrates by using Inverse-magnetostriction Effect

机译:采用逆磁致伸缩效应造型磁阻膜对实际基材上的磁致索传测测量

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After forming electric devices, a magnetostriction effect sometimes deteriorates the sensitivity of sensors such as read heads of hard disk devices, or the bit stability of memories such as magnetic random access memories through the inverse-magnetostriction phenomenon. We should, therefore, know the magnetostriction constant of magnetic films on the practical substrates. In this paper, I present a new method by detecting the changes in coercive force, Hc, with mechanically bending the substrates. This method uses the inverse-magnetostriction effect and I show the magnetostriction constant can be calculated from the gradient of the applied stress vs. Hc curves. With this method, I have successfully measured the magnetostriction constant of the GMR films fabricated, on the practical substrates with a high sensitivity over 10~(-7). This method will be useful for the magnetic thin films with a large anisotropy field.
机译:在形成电气设备之后,磁致索效果有时会使传感器的敏感性劣化,例如硬盘装置的读取头,或者通过逆磁致索现象诸如磁性随机接入存储器的存储器的比特稳定性。因此,我们应该知道实用基板上的磁膜的磁致伸缩常数。在本文中,我通过检测矫顽力,HC的变化,提出了一种新方法,其机械地弯曲基板。该方法使用逆磁致伸缩效果,并且我示出了磁致伸缩常数可以从施加的应力与HC曲线的梯度计算。通过这种方法,我已经成功地测量了制造的GMR膜的磁致伸缩常数,在具有高灵敏度的实际基板上超过10〜( - 7)。该方法对于具有大各向异性场的磁性薄膜是有用的。

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