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Influence of growth morphology on the Neel temperature of CrRu thin films and heterostructures

机译:生长形态对CRRU薄膜的尼尔温度的影响及异质结构

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Dimensionality effects on epitaxial and polycrystalline Cr_(1-x)Ru_x alloy thin films and in Cr/Cr-Ru heterostructures are reported. X-ray analysis on Cr_(0.9965)Ru_(0.0035) epitaxial films indicates an increase in the coherence length in growth directions (10 0) and (110) with increasing thickness (d), in the range 20≤d≤300nm. Atomic force microscopy studies on these films shows pronounced vertical growth for d>50nm, resulting in the formation of columnar structures. The Neel temperatures (T_N) of the Cr_(0.9965)Ru_(0.0035) films show anomalous behaviour as a function of d at thickness d≈50nm. It is interesting to note that this thickness corresponds to that for which a change in film morphology occurs. Experiments on epitaxial Cr_(1-x)Ru_x thin films, with 0≤x≤0.013 and d = 50nm, give T_N-x curves that correspond well with that of bulk Cr_(1-x)Ru_x alloys. Studies on Cr/Cr_(0.9965)Ru_(0.0035) superlattices prepared on MgO(100), with the Cr layer thickness varied between 10 and 50 nm, keeping the Cr_(0..9965)Ru_(0.0035) thickness constant at 10 nm, indicate a sharp decrease in T_N as the Cr separation layers reaches a thickness of 30 nm; ascribed to spin density wave pinning in the Cr layers for d<30 nm by the adjacent CrRu layers.
机译:报道了对外延和多晶Cr_(1-X)Ru_x合金薄膜和Cr / Cr-Ru异质结构的维度效应。关于CR_(0.9965)Ru_(0.0035)外延膜的X射线分析表明,在20≤D≤300nm的范围内,生长方向(10 0)和(110)中的相干长度的相干长度的增加。对这些薄膜的原子力显微镜研究显示D> 50nm的明显垂直生长,导致柱状结构的形成。 CR_(0.9965)Ru_(0.0035)膜的Neel温度(T_N)显示出异常的行为,作为D以厚的d≈50nm的函数。值得注意的是,该厚度对应于发生薄膜形态的变化。在外延CR_(1-x)Ru_x薄膜上的实验,0≤x≤0.013和d = 50nm,给出与散装CR_(1-x)Ru_x合金的T_N-X曲线相处。在MgO(100)上制备的Cr / Cr_(0.9965)Ru_(0.0035)超晶格,Cr层厚度在10到50nm之间变化,保持CR_(0..9965)Ru_(0.0035)厚度在10nm处,表示T_N的急剧下降,因为Cr分离层达到30nm的厚度;通过相邻的CRRU层归因于CR层中的CR层中的旋转密度波钉扎。

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