机译:生长形态对CrRu薄膜Neel温度和异质结构的影响
Department of Physics, University of Johannesburg, P.O. Box 524, Auckland Park, Johannesburg 2006, South Africa;
Department of Physics, University of Johannesburg, P.O. Box 524, Auckland Park, Johannesburg 2006, South Africa;
San Jose Research Center, Hitachi Global Storage Technologies, 3403 Yerba Buena Road, San Jose, CA 95135, USA;
University of California, San Diego, La Jolla, CA, USA;
Department of Physics, University of Johannesburg, P.O. Box 524, Auckland Park, Johannesburg 2006, South Africa;
Department of Physics, University of Pretoria, Lynwood road, Pretoria, South Africa;
Cr alloy; epitaxial thin film; heterostructure; spin density wave; electrical resistivity;
机译:POR-SI子层对
机译:交换耦合异质结构中有限尺寸尺度对反铁磁Cr_2O_3(0001)膜的Neel温度的影响
机译:交换耦合异质结构中有限尺寸尺度对反铁磁Cr2O3(0001)膜的Neel温度的影响
机译:生长形态对CRRU薄膜的尼尔温度的影响及异质结构
机译:绿色化学和机械方面的固态合成银纳米线,影响纳米胎生长和等离子体研究的Au薄膜/ MOS2表面增强拉曼光谱法
机译:LEEM研究了衬底温度对Ir {111}负载石墨烯上对亚联苯基薄膜生长的影响
机译:生长形态对CrRu薄膜和异质结的Neel温度的影响