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Influence of growth morphology on the Neel temperature of CrRu thin films and heterostructures

机译:生长形态对CrRu薄膜Neel温度和异质结构的影响

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Dimensionality effects on epitaxial and polycrystalline Cr_(1-x)Ru_x alloy thin films and in Cr/Cr-Ru heterostructures are reported. X-ray analysis on Cr_(0.9965)Ru_(0.0035) epitaxial films indicates an increase in the coherence length in growth directions (10 0) and (110) with increasing thickness (d), in the range 2050nm, resulting in the formation of columnar structures. The Neel temperatures (T_N) of the Cr_(0.9965)Ru_(0.0035) films show anomalous behaviour as a function of d at thickness d≈50nm. It is interesting to note that this thickness corresponds to that for which a change in film morphology occurs. Experiments on epitaxial Cr_(1-x)Ru_x thin films, with 0≤x≤0.013 and d = 50nm, give T_N-x curves that correspond well with that of bulk Cr_(1-x)Ru_x alloys. Studies on Cr/Cr_(0.9965)Ru_(0.0035) superlattices prepared on MgO(100), with the Cr layer thickness varied between 10 and 50 nm, keeping the Cr_(0.9965)Ru_(0.0035) thickness constant at 10 nm, indicate a sharp decrease in T_N as the Cr separation layers reaches a thickness of 30 nm; ascribed to spin density wave pinning in the Cr layers for d<30nm by the adjacent CrRu layers.
机译:报道了尺寸对外延和多晶Cr_(1-x)Ru_x合金薄膜以及Cr / Cr-Ru异质结构的影响。 Cr_(0.9965)Ru_(0.0035)外延膜的X射线分析表明,在20 50nm时垂直生长明显,导致形成了柱状结构。 Cr_(0.9965)Ru_(0.0035)薄膜的尼尔温度(T_N)在厚度d≈50nm处表现出与d有关的异常行为。有趣的是,该厚度对应于膜形态发生变化的厚度。在0≤x≤0.013且d = 50nm的外延Cr_(1-x)Ru_x薄膜上进行的实验得出的T_N-x曲线与块状Cr_(1-x)Ru_x合金的相吻合。在MgO(100)上制备的Cr / Cr_(0.9965)Ru_(0.0035)超晶格的研究表明,Cr_(0.9965)Ru_(0.0035)的厚度恒定在10 nm,Cr层厚度在10到50 nm之间变化。随着Cr分离层的厚度达到30 nm,T_N急剧下降;归因于相邻的CrRu层将d <30nm的自旋密度波钉扎在Cr层中。

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