An Analytical Model for Chemical Etching in One Dimensional Space

摘要

In this paper an analytical model for chemical etching in one dimensional space has been presented. Regarding to the special specifications of Ferric chloride, etching of an Aluminum work piece exposed to Ferric chloride etchant has been modeled. The proposed model shows that, in the condition of constant reaction parameters, etching rate is a linear function of time. Excellent agreement between the proposed model and the experimental results, published by Cakir (2008), validates the model. By generalization the proposed model, etching rate, or in the other word depth of etch in a specified time, for different materials with different etchants can be predicted.