首页> 外文会议>SPIE Conference on Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications >Double Pulse Laser deposition of polymer Nanocomposite: NaYF_4:Tm~(3+),Yb~(3+) films for optical sensors and light emitting applications
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Double Pulse Laser deposition of polymer Nanocomposite: NaYF_4:Tm~(3+),Yb~(3+) films for optical sensors and light emitting applications

机译:双脉冲激光沉积聚合物纳米复合材料:NayF_4:Tm〜(3 +),Yb〜(3+)光学传感器和发光应用的薄膜

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The main objective of this paper is to demonstrate the feasibility of producing operationally Nanocomposite polymeric thin films for sensor and light emitting applications using the innovative modified double pulsed laser deposition (DPLD) technique. The existing PLD vacuum chamber was modified to accommodate multiple wavelength laser beams for in-situ-double-ablation/Deposition (DPLD) of multiple targets of host and dopants. Special design was made for cooling of the target to the threshold of the polymer ablation without interrupting the continuity of the ablation process. Multilayered of nanocomposites of acrylic polymers and nanoparticles of NaYF4:Tm3+,Yb3+are fabricated using ultra-violet (UV) radiation (355 nm) ablating polymer targets and near-infra-red (near-IR) radiation (1064 nm) ablating inorganic targets. The films were characterized using the reflected high energy electron diffraction (RHEED), XRD, XRF, AFM, and FTIR absorption spectroscopy and tested as possible chemical sensors and light emitters.
机译:本文的主要目的是展示使用创新的改进的双脉冲激光沉积(DPLD)技术生产用于传感器和发光应用的可操作纳米复合材料聚合物薄膜的可行性。修改现有的PLD真空室以适应多个波长激光束以用于原位 - 双烧蚀/沉积(DPLD)的多个宿主和掺杂剂。对聚合物消融的阈值进行特殊设计,而不会中断烧蚀过程的连续性。使用紫外(UV)辐射(355nm)烧蚀聚合物靶标制备丙烯酸聚合物和Nayf4:TM3 +,YB3 +的纳米颗粒的纳米粒子的多层复合材料,并近乎红外线(近红外)辐射(1064nm)烧蚀无机目标。使用反射的高能量电子衍射(RHEED),XRD,XRF,AFM和FTIR吸收光谱,并作为可能的化学传感器和光发射器进行测试。

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