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Mott-Schottky Analysis of Passive Films on Zinc by Electrochemical Impedance Spectroscopy under Potential Control

机译:电化学阻抗光谱在潜在控制下锌的Mott-Schottky分析

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Generally, Mott-Schottky analysis on semiconducting materials is carried out by measurement of the impedance at different applied potentials using a single frequency. Thus, a simple capacity model is underlying the data evaluation and only one physical process for the sample is assumed to determine the measured impedance, e.g. variation of space charge layer thickness with potential. Electrochemically active materials exhibit a more complicated behaviour and other processes might influence the impedance at the chosen frequency. Therefore, measurement of the impedance spectrum in a wide range of frequencies would be desirable. Unfortunately, impedance data might also contain errors and artifacts originating from bandwidth restrictions of the potentiostat or cross talk between electrodes in a 3-electrode configuration. In this work, we present accurate electrochemical impedance measurements on zinc oxide passive films in the frequency range from 10~(-3)Hz to 10~6Hz with simussltaneous potential control.
机译:通常,通过使用单个频率测量不同施加电位的阻抗来进行半导体材料的Mott-Schottky分析。因此,简单的容量模型是基础的数据评估,并且假设仅示例的一个物理过程来确定测量的阻抗,例如,确定测量的阻抗。空间电荷层厚度的变化具有潜力。电化学活性材料表现出更复杂的行为,其他方法可能影响所选择的频率的阻抗。因此,期望在宽范围频率中测量阻抗光谱。遗憾的是,阻抗数据还可能包含源自Potentiostat的带宽限制的错误和伪像,或者在3电极配置中电极之间的串扰。在这项工作中,我们在频率范围为10〜(3)Hz的氧化锌无源膜上的精确电化学阻抗测量与Simusslotiote潜在控制。

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