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Structural, optical and electronic properties of Cu-doped ZnO films synthesized by RF magnetron sputtering

机译:通过RF磁控溅射合成的Cu掺杂ZnO膜的结构,光学和电子性质

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Zn_(1-x)Cu_xO films were prepared by radio frequency (RF) magnetron sputtering method. The wurtzite ZnO crystal can be well retained up to a Cu composition of 10% and doped Cu ions substituted into Zn sites of ZnO host lattice. All the samples show high transparency over the wavelengths from 400 to 1000 nm. The room temperature (RT) resistivity shows an increase in Mn doping samples, which indicates that the doped element is at the status of deep donor levels. The decrease in the bandgap in Cu doped ZnO films rather than in pure ZnO film indicates that there are impurity bands created by Cu 3d orbital or strong d-p coupling between Cu and O in our samples. In addition, photoluminescence (PL) spectra show UV emission at ~3.19 eV shifts to lower energy side with Cu doping, indicating the possibility of band-gap engineering in Zn_(1-x)Cu_xO films.
机译:通过射频(RF)磁控溅射方法制备Zn_(1-X)Cu_xo薄膜。紫立钛矿ZnO晶体可以很好地保留到ZnO宿主晶格的Zn位点的10%和掺杂Cu离子的Cu组合物。所有样品在400至1000nm的波长上显示出高透明度。室温(Rt)电阻率显示出Mn掺杂样品的增加,这表明掺杂元素处于深供料水平的状态。 Cu掺杂ZnO膜中的带隙的减小而不是纯ZnO膜中的表明,在我们的样品中Cu和O之间的Cu 3D轨道或强D-P耦合存在杂质带。此外,光致发光(PL)光谱显示〜3.19 EV的UV发射与Cu掺杂的较低能量侧,表明Zn_(1-x)Cu_xo膜中带隙工程的可能性。

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