The capabilities of a focused ion beam (FIB) to directly remove or deposit material with accuracies of a few nanometers and the ability to observe these patterning processes live with a scanning electron microscope (SEM) in DualBeam~(TM) instruments are attracting an increasing number of nanoprototyping applications across a wide range of use cases. The majority of applications to date have aimed at achieving the smallest possible feature sizes for groups of a few small pattern elements. Modern FIB- column technology has not only reduced the minimum spot size, pushing to smaller nanodevice dimensions, but has also led to improved beam profiles at large and intermediate FIB currents. Focused ion beams with high beam currents and yet small spot sizes and narrow profiles are opening novel opportunities to expand FIB prototyping to larger areas of complex shapes. The better understanding of adequate strategies for FIB patterning [1] has led to the development of optimized strategies for FIB patterning and automated process control.
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