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Ruthenium Thin Film Growth under Low Temperature Pulsed CVD Conditions Using Carbonyl-Diene Precursor

机译:钌薄膜在低温下的脉冲CVD条件下使用羰基二烯前体进行

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This paper is devoted to the investigation of the ruthenium films, chemically vapor deposited under low temperature and sequentially pulsed gas injection conditions. Experimental results presented and published in 2006-2008 have been briefly consolidated. This paper can be interesting to those working in modern precision technologies as well as postgraduate students.
机译:本文致力于研究钌膜,低温下沉积的化学气相,依次脉冲气体注入条件。 2006 - 2008年提出和公布的实验结果已简要巩固。本文对现代精密技术以及研究生的人来说,这篇论文非常有趣。

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