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Optimum repeater insertion to minimize the propagation delay into 32nm RLC interconnect

机译:最佳的中继器插入以最小化传播延迟到32nm rlc互连

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When high speed integrated digital circuits technology scales down from one node to the other as ITRS recommends, a significant gain is obtained on signal speed, consumption and area of CMOS transistors. Nevertheless a specific issue occurs from the 45 nm technology node. The obtained gain on active devices is foiled by an increase of interconnect propagation delays in the Back-End of Line (BEOL). This issue especially concerns relatively long (few hundred of mm) interconnects of the intermediate metal level. By introducing drivers (repeaters) in order to divide long interconnect in shorter sections and choosing optimal drivers sizes, speed can be maximized. This paper proposes a new optimal buffer sizing, and maximum length to be used for repeater networks, to optimize propagation delay for long interconnect of the 32nm technology, by taking into account, for the first time, the input transition time at each stage.
机译:当高速集成数字电路技术从一个节点缩小到另一个节点时,在ITRS推荐的情况下,在CMOS晶体管的信号速度,消耗和面积上获得显着增益。 然而,从45 nm技术节点发生了特定问题。 通过线路(BEOL)后端的互连传播延迟的增加,所获得的有源器件上的增益被挫折。 这个问题特别涉及中间金属水平的相对较长(几百毫米)。 通过引入驱动程序(中继器)以便在较短的部分中划分长互连并选择最佳驱动器尺寸,速度可以最大化。 本文提出了一种新的最佳缓冲区尺寸和用于中继网络的最大长度,以优化32nm技术的长期互连的传播延迟,首次考虑每个阶段的输入转换时间。

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