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Impact ionization rates for strained SiGe

机译:应变SiGe的冲击电离速率

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摘要

With Fermi's golden rule we have calculated the impact ionization (II) rates for strained SiGe. In our approach, the energy and the momentum are exactly conserved during the calculation of the six-dimensional integral in k-space over 4 conduction and 3 valence bands. The wave-vector space is discretized with a very fine grid with a spacing of up to 1/40(27π/a), where a is the lattice constant. II coefficient and quantum yield for relaxed Si and strained SiGe are calculated through Full-Band Monte Carlo simulations. Good agreement between simulation and experimental data for relaxed Si is achieved.
机译:通过Fermi的黄金法则,我们已经计算了紧张SiGe的影响电离(II)率。在我们的方法中,在通过4传导和3个价带中的k空间中的六维积分计算期间能量和动量在计算期间。波动矢量空间用非常细的网格离散化,其间距高达1/40(27π/ a),其中A是晶格常数。通过全带蒙特卡罗模拟计算宽松Si的系数和量子产率和紧张SiGe。达到了浅谈仿真和实验数据之间的良好一致性。

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