THE EFFECT OF SUBSTRATE LOCATION ARRANGEMENT IN THE PVD DEPOSITION CHAMBER ON THE MECHANICAL PROPERTIES OF THE COATINGS

摘要

Hard thin films (CrN), commonly called as hard coatings, have been successfully used to increase many engineering component life, especially forming dies and machining tools. PVD coating deposition process is one of the most popular processes used for such purposes. However, the coatings properties produced by PVD process have been found to vary significantly from oneprocess to another process. Many researchers have been carried out the experiment to investigate the effect of the deposition parameters, such as, deposition current, voltage and pressure etc., on the coating properties. In this work, the effect of substrate location in a deposition chamber on the microstructure and the mechanical properties of the film has been investigated. The results in this research have been shown that substrate location in a deposition chamber has significantly effect on the film thickness, whereas the surface roughness increase with a decrease in the substrate base and target distance. However, CrN hardness was found to be independent on the substrate location.