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High Temperature Oxidation of SiC Powder in Oxidizing Atmosphere Containing Water Vapor

机译:含水蒸汽氧化气氛中SiC粉末的高温氧化

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Oxidation of SiC powder was studied at 1373 K to 1873 K in Ar-O_2, Ar-H_2O, and Ar-O_2-H_2O using thermogravimetry. At 1373 K to 1573K, the weight gain increased with increasing water vapor pressure. The oxidation rate was evaluated on the basis of the Ginstering-Brounshtein kinetic model. In this temperature region, the apparent activation energy for the oxidation was almost the same (139-191 kJmol~(-1)) independent of the atmosphere, suggesting that the same oxidation process proceeds. On the other hand, at temperatures >1673 K, the weight gain in the dry O_2 (Ar-O_2) was greater than that in the wet and wet O_2 (Ar-H_2O and Ar-O_2-H_2O). The apparent activation energy in the dry O_2 (442 kJmol~(-1)) was much greater than that in the wet and wet O_2. We propose that water molecule diffused in silica layer in the wet and wet O_2 atmosphere at 1373 K to 1873 K.
机译:使用热重杂志,在Ar-O_2,Ar-H_2O和Ar-O_2-H_2O中在1373k至1873k下研究SiC粉末的氧化。在1373 k至1573k时,随着水蒸气压力的增加而增加。基于甘透化 - BROUNSHTEIN动力学模型评价氧化率。在该温度区域中,氧化的表观活化能量几乎相同(139-191 kJmol〜(-1)),无关,暗示相同的氧化过程进行。另一方面,在温度> 1673k,干燥O_2(Ar-O_2)中的重量增益大于湿和湿O_2(Ar-H_2O和Ar-O_2-H_2O)中的重量增益。干燥O_2(442kJmol〜(-1)中的表观活化能量远大于湿和湿O_2中的明显激活能量。我们提出在湿的湿的O_2气氛中在二氧化硅层中扩散的水分子在1373k至1873k。

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