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A Simple and Effective Route to Annihilate Defects in Nanocrystalline SnO_2 Thin Films Prepared by Pulsed Laser Deposition

机译:通过脉冲激光沉积制备的纳米晶SnO_2薄膜中的纳米晶缺陷的简单有效途径

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The microstructural defects of nanocrystalline SnO_2 thin films prepared by pulsed laser deposition have been investigated using transmission electron microscopy, high-resolution transmission electron microscopy and Raman spectroscopy. Defects inside nanocrystalline SnO_2 thin films could be significantly reduced by annealing the SnO_2 thin films at 300°C for 2 h. High-resolution transmission electron microscopy showed that stacking faults and twins were annihilated upon annealing. In particular, the edges of the SnO_2 nanoparticles demonstrated perfect lattices free of defects after annealing. Raman spectra also confirmed that annealing the specimen was almost defect-free. By using thermal annealing, defect-free nanocrystalline SnO_2 thin films can be prepared in a simple and practical way, which holds promise for applications as transparent electrodes and solid-state gas sensors.
机译:通过透射电子显微镜,高分辨率透射电子显微镜和拉曼光谱研究了通过脉冲激光沉积制备的纳米晶SnO_2薄膜的微观结构缺陷。通过在300℃下在300℃下退火2小时,可以显着降低纳米晶的SnO_2薄膜内的缺陷。高分辨率透射电子显微镜表明,在退火时湮灭堆叠故障和双胞胎。特别地,SnO_2纳米颗粒的边缘在退火后的不含缺陷的完美晶格证明了完美的晶格。拉曼光谱还证实,退火标本几乎无缺陷。通过使用热退火,可以以简单且实用的方式制备缺陷的纳米晶SnO_2薄膜,其将应用作为透明电极和固态气体传感器。

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