Selective deposition of conductive copper films on glass surfaces using femtosecond laser surface modification and electroless plating

摘要

In this paper, selective deposition of conductive copper films on glass surfaces is demonstrated with the assistance of femtosecond laser surface modification followed by electroless plating. Irradiation of femtosecond laser makes it possible to selectively deposit copper films in the irradiated area on glass surfaces coated with silver nitrate films. The influence of the laser direct writing parameters and the electroless plating process on the formation of copper films is discussed. Meanwhile, the electric properties of copper films are investigated, which confirms that copper films are conductive. A tentative mechanism of the selective deposition process is also proposed. In addition, the potential application of this technique for integrating electrical and thermal functions into microdevices is discussed.