首页> 外文会议>SPIE Conference on Photonics North >Porous silicon: electrochemical microstructuring, photoluminescence and covalent modification
【24h】

Porous silicon: electrochemical microstructuring, photoluminescence and covalent modification

机译:多孔硅:电化学微观结构,光致发光和共价修饰

获取原文

摘要

Interest in porous silicon (PS) has increased dramatically over the past two decades due to aspects such as photoluminescence due to quantum confinement, large surface area, and micro/nanoscale architecture. In this work, <111> p-type silicon wafers have been electrochemically etched with ethanolic solutions of hydrofluoric acid. Discrete surface domains showing luminescence were observed. The domains were typically many tens of micrometers in size and had a height of about 6-8 μm. Interestingly, central round wells of 10-30 μm diameter were observed to form within domains. Investigation of luminescence in depth profile of the wells was done using confocal fluorescence microscopy, and the results indicated that the domains were fully porous and luminescent throughout the entire depth. Spectrally, the peak fluorescence emission was in the range of 550-750 nm and the spectra had an average FWHM equal to about 150 nm. Covalent attachment of organic monolayers to the porous silicon surfaces was done to try and passivate against oxidation, and also to explore the possibilities of bioconjugation and tuning of the photoluminescence wavelength. A reaction of hydrogen terminated silicon with ω-undecylenyl alcohol was done using irradiation by a UV source, and successful derivatization was confirmed with IR spectroscopy. Bulk electrochemical etching of silicon provided a method to generate distributed luminescent structures suitable for compartmentalization of reactions within wells of micrometer dimensions without the use of spatially resolved fabrication methodologies such as epitaxial deposition, lithography, or ion beam technologies.
机译:由于量子限制,大表面积和微/纳米尺度架构等光致发光等方面,对多孔硅(PS)对多孔硅(PS)的兴趣在过去的二十年中显着增加。在这项工作中,用氢氟酸的乙醇溶液电化学蚀刻了<111> p型硅晶片。观察显示发光的离散表面域。该域通常尺寸的数量尺寸通常是多条微米,并且高度为约6-8μm。有趣的是,观察到10-30μm直径为10-30μm的中央圆孔,形成在结构域内。使用共聚焦荧光显微镜进行孔的深度分布中发光的研究,结果表明,该域在整个深度中是完全多孔的致发光。光谱,峰值荧光发射在550-750nm的范围内,并且光谱的平均fwhm等于约150nm。将有机单层与多孔硅表面的共价附着以尝试和钝化氧化,并且还探讨生物杂交和调谐光致发光波长的可能性。使用UV源辐射进行氢封端硅与ω-亚丁烯醇的反应,并通过IR光谱证实了成功的衍生化。硅的批量电化学蚀刻提供了一种产生适用于米尺尺寸孔内反应的分隔率化的分布式发光结构的方法,而不使用空间分辨的制造方法,例如外延沉积,光刻或离子束技术。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号