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Lanthanum Silicate Coating Obtained by Direct Current Magnetron Sputtering Processes on Porous Substrate Cells

机译:通过直接电流磁控溅射工艺在多孔底物细胞上获得的镧硅酸盐涂层

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摘要

La-Si metallic coatings were synthesized by Direct Current Magnetron Sputtering of lanthanum and silicon targets in pure argon atmosphere. After the deposition stage, the ceramic apatite-structure coatings were obtained by thermal oxidation in air. The structural and chemical features of these films have been assessed by X-Ray Diffraction (XRD) and Scanning Electron Microscopy (SEM). The electrical properties were determined by complex impedance spectroscopy in planar configuration. The films with near lanthanum silicate La/Si atomic ratio deposited on porous Ni-YSZ cermet substrates were initially amorphous. After thermal oxidation at 1173 K in air, the coating crystallised under the expected apatite structure. SEM observation revealed that the film compactness and thickness increased after thermal oxidation. The electrical measurements carried out under air as a function of temperature (1173 to 723 K) show only one contribution for the apatite layer on the Nyquist diagram. This contribution is characteristic of the bulk materials response. The electrical properties were controlled by the Arrhenius law with an activation energy (E_a = 0.2 eV) slightly lower than that of the literature.
机译:通过纯氩气氛中的镧和硅靶的直接电流磁控溅射合成La-Si金属涂层。在沉积阶段之后,通过空气中的热氧化获得陶瓷磷灰石结构涂层。这些薄膜的结构和化学特征已经通过X射线衍射(XRD)和扫描电子显微镜(SEM)评估。通过平面配置中的复杂阻抗光谱法测定电性能。具有沉积在多孔Ni-YSZ金属陶瓷基材上的硅酸盐La / Si原子比的薄膜最初是无定形的。在1173 k在空气中热氧化后,涂层在预期的磷灰石结构下结晶。 SEM观察显示热氧化后的膜紧凑性和厚度增加。作为温度的函数(1173至723k)在空气下进行的电测量仅显示奈奎斯特图上的磷灰石层的一个贡献。这种贡献是散装材料反应的特征。电气性质由Arrhenius定律控制,激活能量(E_A = 0.2eV)略低于文献。

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