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Behaviors of Fracture Toughness of Thin Transparent Glass for LiquidCrystal Display by EB Irradiation

机译:EB辐照液晶显示器薄透明玻璃断裂韧性的行为

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An influence of electron beam (EB) irradiation on the crack generation and propagation of transparent glasses arestudied by using a standard indentation fracture method. The thin (less than 0.5mm) transparent glass is used forsubstrate of more than 100 inches crystal liquid display. However, it is difficult to product ultra thin and large-sizesubstrate without fracture. Therefore, these glasses have been expected to enhance the fracture toughness ofsubstrate for the displays. As results, EB irradiation, which is one of short-time treatments of dry process at low temperature, increases thecrack nucleation energy of these glasses, although the EB irradiation does not change the crack propagation energyof these glasses. The EB irradiation generates dangling bonds in these glasses. Partial relaxation of the residualstrain occurs around these dangling bonds in the silica network structure. If the inter-atomic distance of thestronger metal-oxygen pairs becomes optimum on the potential curve of these glasses, the relaxation increases thebonding energy of the network structure. Evidently, the enhancement of crack nucleation energy is mainly due toan increase in the bonding energy for the stronger metal-oxygen atomic pairs in the atomic network structure, aswell as the relaxation of the network structure.
机译:电子束(EB)辐射对通过使用标准凹口裂缝法而作出的透明眼镜裂缝产生和传播的影响。薄(小于0.5mm)透明玻璃,用于超过100英寸的晶体显示器。然而,难以在没有骨折的情况下产品超薄和大尺寸。因此,已经预期这些玻璃可增强显示器的裂缝韧性。结果,EB辐射是低温下干法的短时间处理之一,增加了这些眼镜的核心成核能,尽管EB照射不会改变这些玻璃的裂缝繁殖能量。 EB辐射产生这些玻璃中的悬空键。剩余围绕在二氧化硅网络结构中的这些悬空键周围发生部分松弛。如果TheStronger金属 - 氧对的原子距离在这些玻璃的电位曲线上变得最佳,则弛豫增加了网络结构的粘合能量。显然,裂缝成核能量的增强主要是由于原子网络结构中较强金属 - 氧原子对的粘合能量增加,作为网络结构的松弛。

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