Effects of Pattern Size, Dual Side Patterning, and Imprint Materials inthe Fabrication of Antireflective Structure Using Nanoimprint

摘要

One of the useful applications using NIL is the fabrication of antireflection structure (ARS) which has a sub-wavelengthnanostructure similar to moth-eye below wavelength of visible light because the ARS can be used in anti-glare monitor,dashboards, and solar cells. The material selection of mold and resin in the NIL process for ARS is very important forthe purpose of real application and mass production. Generally, the mold should have flexibility for continuous massproduction and final structure should have strong durability under outdoor environment. In this work, the effect of singleside and dual side patterning were investigated by change of pitch from moth-eye to photonic crystal on the flexiblepolymer substrate by using NIL. Then, the effect of fluorine resin with low refractive index was tested. Finally, afabrication method of ARS of pitch of 250nm with high fidelity and accuracy using the high-resolution PDMS mold byaid of solvent mixing of low viscosity was presented. Generally, it is difficult for Sylgard PDMS to make nanopatternbelow 300nm pitch without special treatment.