Effect of Precursor Concentration and Film Thickness Deposited by Layer on Nanostructured TiO_2 Thin Films

摘要

Sol-gel spin coating method is used in the production of nanostructured TiO_2 thin film. The surface topology and morphology was observed using the Atomic Force Microscopy (AFM) and Field Emission Scanning Electron Microscopy (FESEM). The electrical properties were investigated by using two probe current-voltage (I-V) measurements to study the electrical resistivity behavior, hence the conductivity of the thin film. The solution concentration will be varied from 14.0 to 0.01wt% with 0.02wt% interval where the last concentration of 0.02 to 0.01wt% have 0.01wt% interval to find which concentrations have the highest conductivity then the optimized concentration's sample were chosen for the thickness parameter based on layer by layer deposition from 1 to 6 layer. Based on the result, the lowest concentration of TiO_2, the surface becomes more uniform and the conductivity will increase. As the result, sample of 0.0lwt% concentration have conductivity value of 1.77E~(-10) S/m and will be advanced in thickness parameter. Whereas in thickness parameter, the 31ayer deposition were chosen as its conductivity is the highest at 3.9098E~9 S/m.