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Growth Pattern of Zinc Oxide Nanorods on Gold Coated Silicon Surfaces

机译:金涂层硅表面上的氧化锌纳米棒的生长图案

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Nanostructured ZnO nanorods on gold (Au) coated silicon (Si) surfaces were made by solution method immerse technique, using (ZnNO_3)_2/HMTA at 80° C. The seed surfaces of Au were sputter-coated on Si <100> substrates, in which Au thicknesses were affected by current and sputter-coating time. The morphology of the prepared nanostructure was analysed by scanning electron microscope (SEM), and the structural identification of the ZnO nanorods was carried out using X-ray diffraction in the range of 20 between 30° – 60°. The growth intensity of ZnO nanorods on the substrate was found to be consistent from 3 nm to 12 nm of Au, at 15 nm there is a tremendous drop in growth. The resulting (hkl) peaks were found to be lattice planes of (100), (002), (101), (102) and (110). The presence of Au at thickness 3 - 12 nm gave preferential orientation of Zn (100), (002) and (101), though at different intensity.
机译:通过溶液方法浸没技术,在80℃下使用(ZnNO_3)_2 / HMTA来制备金(Au)涂覆的硅(Si)表面上的纳米结构ZnO纳米棒。在Si <100>基板上溅射Au的种子表面,其中μU厚度受电流和溅射涂布时间的影响。通过扫描电子显微镜(SEM)分析制备纳米结构的形态,使用X射线衍射在20°-60°之间的X射线衍射中进行ZnO纳米棒的结构鉴定。发现ZnO纳米棒对基板上的生长强度从3nm至12nm的au,15nm呈巨大的生长下降。发现所得(HKL)峰是(100),(002),(101),(102)和(110)的晶格平面。厚度3-12nm处的Au的存在产生了Zn(100),(002)和(101)的优先取向,但在不同的强度下。

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