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Amorphous SiO_x Nanowires And Aligned Nano-Cakes: The Growth Mechanism And Photoluminescence

机译:非晶SiO_x纳米线和对齐的纳米蛋糕:生长机理和光致发光

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The growth of Sig nanostructures nanowires and nano-cakes on Au-coated n-type-Silicon (100) substrate via thermal evaporation were studied. The diameters of the obtained nanowires varied from 20 nm to about 260 nm and 100 nm to several microns in length. Based on SVLS growth mechanism, the yield obtained decreased as the argon flow rate increased. A broad emission band from 290 to 600 nm is observed in the photoluminescence (PL) spectrum of these nanowires. There are five PL peaks: two blue emission peaks 465 nm (2.67 eV) and 482 nm (2.57 eV) and two green bands centred at 502 nm (2.47 eV) and 506 nm (2.45 eV) and one ultraviolet emission peak at 350 nm (3.54 eV), which may be related to the various oxygen defects and twofold coordinated silicon lone pair centres. Detailed characterizations on the resulting nanostructures were carried out using field-emission scanning electron microscopy (FESEM) and energy-dispersed X-ray spectroscopy (EDX) and X-ray diffraction (XRD).
机译:研究了SIG纳米结构纳米线的生长和通过热蒸发的Au涂覆的n型硅(100)基材上的纳米蛋白酶的生长。所得纳米线的直径在20nm至约260nm和100nm的长度中变化为100nm至几微米。基于SVLS生长机制,随着氩流量的增加而获得的产量降低。在这些纳米线的光致发光(PL)光谱中观察到来自290至600nm的宽发射带。有五个PL峰值:两个蓝色发射峰465nm(2.67eV)和482nm(2.57eV)和以502nm(2.47eV)和506nm(2.45eV)和350nm的紫外发射峰为中心的两个绿色带(3.54eV),其可能与各种氧缺陷和双重协调的硅孤立型中心有关。使用现场 - 发射扫描电子显微镜(FeSEM)和能量分散的X射线光谱(EDX)和X射线衍射(XRD)进行了所得纳米结构的详细表征。

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