首页> 外文会议>International Conference on Nanoscience and Nanotechnology >Study on the Ohmic Contact, Electrical and Optical Properties of Nanostructured Titanium Dioxide Thin Films
【24h】

Study on the Ohmic Contact, Electrical and Optical Properties of Nanostructured Titanium Dioxide Thin Films

机译:纳米结构钛二氧化钛薄膜的欧姆接触,电气和光学性能研究

获取原文

摘要

Nanostructured Titanium Dioxide (TiO_2) thin film with various sol-gel concentrations has been successfully prepared using sol-gel spin coating method. Nanostructured TiO_2 thin films prepared at different sol-gel concentration from 0.1M to 0.4M. The IV measurement was measured using direct currents between two contacts were measured using Advantest source meter (R6243). To perform the IV measurement, two kinds of metal contact has been used; Platinum (Pt) and Gold (Au). It showed that both of metal contact shows that 0.2M of concentration gives the lowest sheet resistance. The sheet resistance and resistivity of the thin film decreased from 0.1M to 0.2M and significantly increased at 0.3M and 0.4M. Optical transmission spectra were recorded in the wavelength range 200-1000 nm using UV–VIS–NIR Spectrophotometer (VARIAN 5000). The effect of sol concentration on band gap (Eg) values of the TiO_2 thin films has been studied. The lowest band gap is 3.35eV which contribute to 0.2M of concentration and it is also understand that prepared nanostructured TiO_2 thin film is indirect band gap.
机译:使用溶胶 - 凝胶旋涂法成功制备了具有各种溶胶浓度的纳米结构二氧化钛(TiO_2)薄膜。纳米结构的TiO_2薄膜以0.1m至0.4m的不同溶胶 - 凝胶浓度制备。使用Adaftest源表(R6243)测量两个触点之间的直接电流测量IV测量。为了执行IV测量,已经使用了两种金属接触;铂(PT)和金(AU)。结果表明,两种金属接触都表明0.2M的浓度给出了最低薄层电阻。薄膜的薄层电阻和电阻率从0.1m降至0.2m,显着增加在0.3m和0.4m。使用UV-Vis-Nir分光光度计(Varian 5000),在波长范围的波长范围内记录光学透射光谱。研究了溶胶浓度对TiO_2薄膜的带隙(例如)值的影响。最低带隙是3.35EV,其浓度为0.2M浓度,并且还可以理解,制备的纳米结构TiO_2薄膜是间接带隙。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号