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The Studies Of Doping Concentration Effects On VCSEL Laser

机译:VCSEL激光掺杂浓度效应的研究

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The numerical investigation of the performance of 850 nm GaAs single quantum wells (SQW) vertical cavity surface emitting laser (VCSEL) structure was carried out. Laser technology-integrated program ISETCAD simulation has been used to investigate the effect of the doping concentration on the output power performance. We proposed a new model where a few low-doped distributed Bragg reflector (DBR) layers are introduced just after spacer layers in order achieve a better matching of lattice constants. High output power and better efficiency were obtained with the proposed VCSEL structure. A very small deviation from the proposed structure will essentially affect the features of the light output. All material parameters are evaluated based on the recent literature values.
机译:进行了850nm GaAs单量子阱(SQW)垂直腔表面发射激光器(Vcsel)结构的性能的数值研究。激光技术集成程序ISETCAD模拟已被用于研究掺杂浓度对输出功率性能的影响。我们提出了一种新的模型,其中几个低掺杂的分布式布拉格反射器(DBR)层刚刚在间隔层之后引入,以实现晶格常数的更好匹配。使用所提出的VCSEL结构获得高输出功率和更好的效率。与所提出的结构的非常小的偏差将基本上影响光输出的特征。基于最近的文献值评估所有材料参数。

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