Vapor-Phase Deposition of N_3-Containing Monolayers on SiO_2 and Si_3N_4 for Wafer Scale Biofunctionalization

摘要

The vapor-phase deposition of 11-azidoundecyltrimethoxysilane monolayers at reduced pressure and elevated temperature allows the introduction of azido (N_3) functionalized silicon wafer substrates. This process can be optimized by controlling the amount of surface adsorbed water and results in uniform and reproducible self-assembled monolayers (SAMs). The N_3-SAM density as investigated via TOF-SIMS is comparable on thermal oxide and Si_3N_4 substrates. Furthermore, it is demonstrated that biomolecules can be successfully conjugated on both substrates using azide-alkyne 'click' reactions.