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Improvement of Slit Photolithography Process Reliability for Four-Mask Fabrication process in TFT LCDs

机译:TFT LCD中四掩模制造过程的狭窄光刻工艺可靠性的改进

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In order to reduce the manufacturing cost of TFT LCDs and cut down an amount facilities invested, there are many LCD panel makers contributes to convert the current Five-mask manufacturing process into the noble Four-mask fabrication process. We optimized the slit mask to improve the poor process reliability.
机译:为了降低TFT LCD的制造成本并减少投资的金额设施,有许多液晶面板制造商有助于将当前的五掩模制造工艺转换为贵族四掩模制造过程。我们优化了狭缝掩模以提高工艺可靠性差。

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