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Improvement in performance of m-plane GaInN light emitting diode grown on m-plane SiC by sidewall epitaxial lateral overgrowth

机译:侧壁外延横向过度生长在M平面SiC上生长的M平面Gainn发光二极管性能的改进

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GaInN-based light-emitting diodes having m-plane het-erostructures and multi quantum well (MQW) were fabricated on m-plane SiC by sidewall-seeded epitaxial lateral overgrowth. Defects such as stacking faults or dislocations strongly affect the emission wavelength and efficiency of MQW. Control of the VIII ratio during growth is found to be very effective for growing GaN from only one sidewall, by which we can reduce the area of the high-defect-density region. A light emitting diode (LED) with high internal quantum efficiency and an almost single peak LED was successfully fabricated.
机译:通过侧壁种子外延横向过度生长在M平面SiC上制造具有M平面HET-Erostructure和多量子阱(MQW)的基于Gainn的发光二极管。诸如堆叠故障或脱位的缺陷强烈影响MQW的发射波长和效率。发现生长期间的VIII比率对于从仅一个侧壁生长GaN来说是非常有效的,从而可以减少高缺陷密度区域的面积。成功制造具有高内部量子效率和几乎单峰峰LED的发光二极管(LED)。

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