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Magnetic and magnetotransport studies on ternary topological insulator GeBi_4Te_7

机译:Ternary拓扑绝缘体GEBI_4TE_7上的磁性和磁通传输研究

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Temperature and magnetic field dependence of the transport and magnetic properties of ternary topological insulator GeBi_4Te_7 have been studied. Magnetization data shows that the sample remains diamagnetic from 300 K down to 2.5 K whereas, resistivity decreases as temperature decreases and reaches a minimum at 210 K. It increases furtherand attains a maximum at 124 K and then decreases upon reducing the temperature. R (T) measured at 0-15 T shows positive magnetoresistance (MR). The calculated MR % at % <5 K is ~60 %, and it decreases drastically as temperature increases. At T < 124 K, the density of charge carriers (electrons) deduced from Hall measurements is about ~10~(19) cm~(-3) and it increases by one order upon increasing the temperature to 300 K. The lowering of Dirac point due to the lattice distortion caused by the defects at Bi/Ge sites and pinning of Fermi energy deep into the conduction band is believed to cause the observed non-topological signatures in electronic transport properties.
机译:研究了三元拓扑绝缘体GEBI_4TE_7的运输和磁性的温度和磁场的依赖性。磁化数据表明,样品保持从300 k下降至2.5克,而电阻率降低随温度降低并且在210k处达到最小值。它增加并在降低温度时达到最大值。在0-15T中测量的R(t)显示正磁阻(MR)。计算出的MR%在%<5 k为〜60%,随着温度的增加,它随着温度的增加而降低。在T <124 k下,从霍尔测量推导的电荷载体(电子)的密度约为约〜10〜(19)cm〜(-3),并且在将温度增加到300k时,它在一个阶数增加一个订单。降低DIRAC由于Bi / Ge位点的缺陷引起的晶格扭曲,并且据信通过Bi / Ge网站的缺陷引起的Fermi能量钉入导电带,以使观察到的电子传输性能中的非拓扑签名。

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